Minna-Hanna Nieminen

University Lecturer
University Lecturer
T105 Chemistry and Materials
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Honors and awards

Aalto CHEM Educational action of the year 2020

Awarded to AALTOLAB team
Award or honor granted for a specific work Department of Chemistry and Materials Science Dec 2020


Learning experiences from digital laboratory safety training

Panu Viitaharju, Kirsi Yliniemi, Minna Nieminen, Antti J. Karttunen 2021 Education for chemical engineers

Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

Matti Putkonen, M. Nieminen, L. Niinistö 2004 Thin Solid Films

Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy

M Nieminen, T Sajavaara, E Rauhala, M Putkonen, Lauri Niinistö 2001 Journal of Materials Chemistry

Growth of group 3 oxide thin films by atomic layer epitaxy

M. Nieminen, M. Putkonen, E. Rauhala, T. Sajavaara, J. Niinistö, L. Niinistö 2000

Determination of Aluminium in AlCl_3 and Al_(2)O_3 Modified Catalyst Supports

M. Nieminen, L. Niinistö 1999 Fresenius' Journal of Analytical Chemistry

Recent developments in depositing oxide thin films of perovskite-type by atomic layer epitaxy (ALE)

L. Niinistö, M. Nieminen, H. Mölsä, L.-S. Johansson, E. Rauhala, O. Nilsen, H. Seim, H. Fjellvåg 1997

Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor

H. Seim, H. Mölsä, M. Nieminen, H. Fjellvåg, L. Niinistö 1997 Journal of Materials Chemistry

Growth of LaCoO3 thin films from ß-diketonate precursors

H. Seim, M. Nieminen, L. Niinistö, H. Fjellvåg, L-S. Johansson 1997 Applied Surface Science

Deposition of tin oxide into porous silicon by atomic layer epitaxy

C. Ducsö, N. Khanh, Z. Horvath, I. Barsony, M. Utriainen, S. Lehto, M. Nieminen, L. Niinistö 1996 Journal of the Electrochemical Society