Minna-Hanna Nieminen
University Lecturer
University Lecturer
T105 Chemistry and Materials
Full researcher profile
https://research.aalto.fi/...
Sähköposti
[email protected]
Puhelinnumero
+358503438187
Palkinnot
Aalto CHEM Educational action of the year 2020
Awarded to AALTOLAB team
Palkinto tai huomionosoitus tuotoksesta
Kemian ja materiaalitieteen laitos
Dec 2020
Julkaisut
Enhancing 360° virtual laboratory safety training with linear learning pathway design: Insights from student experiences
Samuel Girmay, Kirsi Yliniemi, Minna Nieminen, Jarno Linnera, Antti J. Karttunen
2024
Education for Chemical Engineers
Student experiences from virtual reality-based chemistry laboratory exercises
Panu Viitaharju, Minna Nieminen, Jarno Linnera, Kirsi Yliniemi, Antti J. Karttunen
2023
Education for Chemical Engineers
Learning experiences from digital laboratory safety training
Panu Viitaharju, Kirsi Yliniemi, Minna Nieminen, Antti J. Karttunen
2021
Education for Chemical Engineers
AALTOLAB Virtual Laboratories
Samuel Girmay, Antti Karttunen, Jarno Linnera, Minna Nieminen, Kirsi Yliniemi, Panu Viitaharju, Adel Assad, Päivi Laaksonen, Kim Eklund, Janne Hirvi, Riku Holopainen, Simone Knispel, Nea Möttönen, Pihla Paavola, Eeva-Leena Rautama, Tilda Sjöholm, Mika Torvinen, Benjamin Wilson
2020
Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water
Matti Putkonen, M. Nieminen, L. Niinistö
2004
Thin Solid Films
Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy
M Nieminen, T Sajavaara, E Rauhala, M Putkonen, Lauri Niinistö
2001
Journal of Materials Chemistry
Growth of group 3 oxide thin films by atomic layer epitaxy
M. Nieminen, M. Putkonen, E. Rauhala, T. Sajavaara, J. Niinistö, L. Niinistö
2000
Determination of Aluminium in AlCl_3 and Al_(2)O_3 Modified Catalyst Supports
M. Nieminen, L. Niinistö
1999
Fresenius' Journal of Analytical Chemistry
Determination of Aluminium in AlCl3 and Al2O3 Modified Silica Catalyst Supports
M. Nieminen, L. Niinistö
1998
Recent developments in depositing oxide thin films of perovskite-type by atomic layer epitaxy (ALE)
L. Niinistö, M. Nieminen, H. Mölsä, L.-S. Johansson, E. Rauhala, O. Nilsen, H. Seim, H. Fjellvåg
1997