Minna-Hanna Nieminen
University Lecturer
University Lecturer
T105 Chemistry and Materials
Full researcher profile
https://research.aalto.fi/...
Palkinnot
Aalto CHEM Educational action of the year 2020
Awarded to AALTOLAB team
Palkinto tai huomionosoitus tuotoksesta
Kemian ja materiaalitieteen laitos
Dec 2020
Julkaisut
Learning experiences from digital laboratory safety training
Panu Viitaharju, Kirsi Yliniemi, Minna Nieminen, Antti J. Karttunen
2021
Education for chemical engineers
Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water
Matti Putkonen, M. Nieminen, L. Niinistö
2004
Thin Solid Films
Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy
M Nieminen, T Sajavaara, E Rauhala, M Putkonen, Lauri Niinistö
2001
Journal of Materials Chemistry
Growth of group 3 oxide thin films by atomic layer epitaxy
M. Nieminen, M. Putkonen, E. Rauhala, T. Sajavaara, J. Niinistö, L. Niinistö
2000
Determination of Aluminium in AlCl_3 and Al_(2)O_3 Modified Catalyst Supports
M. Nieminen, L. Niinistö
1999
Fresenius' Journal of Analytical Chemistry
Determination of Aluminium in AlCl3 and Al2O3 Modified Silica Catalyst Supports
M. Nieminen, L. Niinistö
1998
Recent developments in depositing oxide thin films of perovskite-type by atomic layer epitaxy (ALE)
L. Niinistö, M. Nieminen, H. Mölsä, L.-S. Johansson, E. Rauhala, O. Nilsen, H. Seim, H. Fjellvåg
1997
Deposition of LaNiO3 thin films in an atomic layer epitaxy reactor
H. Seim, H. Mölsä, M. Nieminen, H. Fjellvåg, L. Niinistö
1997
Journal of Materials Chemistry
Growth of LaCoO3 thin films from ß-diketonate precursors
H. Seim, M. Nieminen, L. Niinistö, H. Fjellvåg, L-S. Johansson
1997
Applied Surface Science
Deposition of tin oxide into porous silicon by atomic layer epitaxy
C. Ducsö, N. Khanh, Z. Horvath, I. Barsony, M. Utriainen, S. Lehto, M. Nieminen, L. Niinistö
1996
Journal of the Electrochemical Society