Atomically Controlled Materials Engineering

Owing to its fundamental characteristics, ALD is the most powerful thin-film deposition method for controlling functional properties of surfaces and interfaces. ALD is therefore the most suitable and the most versatile method for controlling the key properties of materials for applications in energy. Due to its scalability to large batches of items to be processed, including powders, it perfectly suits for operating bulk materials like conventional battery electrode powders or sheets. At the same time, ALD enables deposition of materials and controlling the properties of them at the nanoscale, suitable for transducers, microbatteries and photoelectrocatalysts (PECs).