Heli Seppänen
Research Engineer
Research Engineer
U400 OtaNano
Full researcher profile
https://research.aalto.fi/...
Email
[email protected]
Phone number
+358503033709
Honors and awards
JVST A Best ALD Paper Award
Award for paper "Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls, by Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen and Mervi Paulasto-Kröckel, JVST A 39, 032403 (2021)"
Award or honor granted for a specific work
Department of Chemistry and Materials Science
Jun 2021
Publications
Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics
Andreas C. Liapis, Vincent Pelgrin, Peng Liu, Xiaoqi Cui, Jose M.A. Rosa, Heli Seppannen, Diao Li, Igor Reduto, Seppo Honkanen, Harri Lipsanen, Zhipei Sun
2023
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
H Seppanen, I Prozheev, C Kauppinen, S Suihkonen, K Mizohata, H Lipsanen
2023
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Effects of atomic layer deposition on the optical properties of two-dimensional transition metal dichalcogenide monolayers
Mikko Turunen, Henry Fernandez Pizarro, Suvi-Tuuli Akkanen, Heli Seppänen, Zhipei Sun
2023
2D Materials
GaAs surface passivation for InAs/GaAs quantum dot based nanophotonic devices
Abhiroop Chellu, Eero Koivusalo, Marianna Raappana, Sanna Ranta, Ville Polojärvi, Antti Tukiainen, Kimmo Lahtonen, Jesse Saari, Mika Valden, Heli Seppänen, Harri Lipsanen, Mircea Guina, Teemu Hakkarainen
2021
Nanotechnology
Atomic layer deposition of AlN using atomic layer annealing - Towards high-quality AlN on vertical sidewalls
Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen, Mervi Paulasto-Kröckel
2021
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Atomic Layer Deposition of PbS Thin Films at Low Temperatures
Georgi Popov, Goran Bačić, Miika Mattinen, Toni Manner, Hannu Lindström, Heli Seppänen, Sami Suihkonen, Marko Vehkamäki, Marianna Kemell, Pasi Jalkanen, Kenichiro Mizohata, Jyrki Räisänen, Markku Leskelä, Hanna Maarit Koivula, Seán T. Barry, Mikko Ritala
2020
Chemistry of Materials
Passivation of Detector‐Grade FZ‐Si with ALD‐Grown Aluminium Oxide
Jennifer Ott, Toni Pasanen, Päivikki Repo, Heli Seppänen, Ville Vähänissi, Hele Savin
2019
Physica Status Solidi (A) Applications and Materials Science
(oral talk) Passivation of Detector‐Grade FZ‐Si with ALD‐Grown Aluminium Oxide
Toni Pasanen, Jennifer Ott, Päivikki Repo, Heli Seppänen, Ville Vähänissi, Hele Savin
2019
Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
Heli Seppänen, Iurii Kim, Jarkko Etula, Evgeniy Ubyivovk, Alexey Buravlev, Harri Lipsanen
2019
Materials
Atomic layer deposition of piezoelectric aluminum nitride thin films
Elmeri Österlund, Heli Seppänen, Mervi Paulasto-Kröckel
2019