Heli Seppänen

Research Engineer
Research Engineer
U400 OtaNano
Full researcher profile
https://research.aalto.fi/...
Phone number
+358503033709

Honors and awards

JVST A Best ALD Paper Award

Award for paper "Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls, by Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen and Mervi Paulasto-Kröckel, JVST A 39, 032403 (2021)"
Palkinto tai huomionosoitus tuotoksesta Kemian ja materiaalitieteen laitos Jun 2021

Publications

Wafer-Scale Atomic-Layer-Deposition of Er3+- and Yb3+- Doped Gain Materials for Integrated Photonics

Andreas C. Liapis, Vincent Pelgrin, Peng Liu, Xiaoqi Cui, Jose M.A. Rosa, Heli Seppannen, Diao Li, Igor Reduto, Seppo Honkanen, Harri Lipsanen, Zhipei Sun 2023

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

H Seppanen, I Prozheev, C Kauppinen, S Suihkonen, K Mizohata, H Lipsanen 2023 JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A

Effects of atomic layer deposition on the optical properties of two-dimensional transition metal dichalcogenide monolayers

Mikko Turunen, Henry Fernandez Pizarro, Suvi-Tuuli Akkanen, Heli Seppänen, Zhipei Sun 2023 2D Materials

GaAs surface passivation for InAs/GaAs quantum dot based nanophotonic devices

Abhiroop Chellu, Eero Koivusalo, Marianna Raappana, Sanna Ranta, Ville Polojärvi, Antti Tukiainen, Kimmo Lahtonen, Jesse Saari, Mika Valden, Heli Seppänen, Harri Lipsanen, Mircea Guina, Teemu Hakkarainen 2021 Nanotechnology

Atomic layer deposition of AlN using atomic layer annealing - Towards high-quality AlN on vertical sidewalls

Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen, Mervi Paulasto-Kröckel 2021 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Atomic Layer Deposition of PbS Thin Films at Low Temperatures

Georgi Popov, Goran Bačić, Miika Mattinen, Toni Manner, Hannu Lindström, Heli Seppänen, Sami Suihkonen, Marko Vehkamäki, Marianna Kemell, Pasi Jalkanen, Kenichiro Mizohata, Jyrki Räisänen, Markku Leskelä, Hanna Maarit Koivula, Seán T. Barry, Mikko Ritala 2020 Chemistry of Materials

Passivation of Detector‐Grade FZ‐Si with ALD‐Grown Aluminium Oxide

Jennifer Ott, Toni Pasanen, Päivikki Repo, Heli Seppänen, Ville Vähänissi, Hele Savin 2019 Physica Status Solidi (A) Applications and Materials Science

(oral talk) Passivation of Detector‐Grade FZ‐Si with ALD‐Grown Aluminium Oxide

Toni Pasanen, Jennifer Ott, Päivikki Repo, Heli Seppänen, Ville Vähänissi, Hele Savin 2019

Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition

Heli Seppänen, Iurii Kim, Jarkko Etula, Evgeniy Ubyivovk, Alexey Buravlev, Harri Lipsanen 2019 Materials

Atomic layer deposition of piezoelectric aluminum nitride thin films

Elmeri Österlund, Heli Seppänen, Mervi Paulasto-Kröckel 2019