Institutionen för kemi och materialvetenskap

Atomkontrollerad materialteknik

Forskningsgrupp ledd av professor Ville Miikkulainen
Photo-ALD copper film on patterned tantalum oxide

Our research focuses and group members

ACME research group 10/06/2026. Photo: Ahmed Othman

ACME team

Meet the researchers of the Atomically Controlled Materials Engineering research group.

Department of Chemistry and Materials Science

News

Left to right: Simone Santucci, Boris Hudec and Ville Miikkulainen

ACME hosted PhotoPrint project collaborators working on Direct Atomic Layer Processing

Prof. Ville Miikkulainen hosted collaborators from the PhotoPrint project to discuss advances in Direct Atomic Layer Processing (DALP®) and thin-film technologies.

News
Ahmed Othman and Shreeram Pillain at Oropa, Italy

ACME at Unite! Research School 2026

Ahmed Othman and Shreeram Pillai participated in Unite! Research School 2026 in Torino and Oropa, Italy, joining an international doctoral programme focused on interdisciplinary collaboration, research communication, and academic development.

News

Senaste publikationer

Mer information om vår forskning finns på Aaltos forskningsportal.
Forskningsportal

Viktiga bakgrundspublikationer

Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materials

Ville Miikkulainen, Marko Vehkamäki, Kenichiro Mizohata, Timo Hatanpää, Mikko Ritala 2021 Advanced Materials Interfaces

Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries

Ville Miikkulainen, Amund Ruud, Erik Østreng, Ola Nilsen, Mikko Laitinen, Timo Sajavaara, Helmer Fjellvåg 2014 Journal of Physical Chemistry C

Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls

Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen, Mervi Paulasto-Kröckel 2021 Journal of Vacuum Science and Technology A
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