Olli Setälä

Doctoral Researcher
Doctoral Researcher
T411 Dept. Electronics and Nanoeng
Full researcher profile
https://research.aalto.fi/...

Kontakuppgifter

Postadress
Tietotie 3 02150 Espoo Finland
Telefonnummer
+358505996346

Forskningsgrupp

  • Hele Savin Group, Doctoral Researcher

Publikationer

Excellent Responsivity and Low Dark Current Obtained with Metal-Assisted Chemical Etched Si Photodiode

Kexun Chen, Olli Setälä, Xiaolong Liu, Behrad Radfar, Toni Pasanen, Michael Serue, Juha Heinonen, Hele Savin, Ville Vähänissi 2023 IEEE Sensors Journal

Improved QE in CMOS image sensors with nano-black antireflection layer

Martin J. Prest, Olli Setälä, Konstantin D. Stefanov, Ville Vähänissi, Hele Savin, Douglas Jordan 2023 2023 International Image Sensor Workshop Proceedings

(oral talk) Improved QE in CMOS image sensors with nano-black antireflection layer

Martin J. Prest, Olli Setälä, Konstantin D. Stefanov, Ville Vähänissi, Hele Savin, Douglas Jordan 2023

Optoelectronic properties of black silicon fabricated by femtosecond laser in ambient air: exploring a large parameter space

Behrad Radfar, Kexun Chen, Olli Setälä, Ville Vähänissi, Hele Savin, Xiaolong Liu 2023 Optics Letters

(invited talk) Excellent Responsivity and Low Dark Current Obtained with Black Si Photodiode

Hele Savin, Kexun Chen, Olli Setälä, Xiaolong Liu, Behrad Radfar, Ville Vähänissi 2023

Boron-implanted black silicon photodiode with close-to-ideal responsivity from 200 to 1000 nm

Olli Setälä, Kexun Chen, Toni Pasanen, Xiaolong Liu, Behrad Radfar, Ville Vähänissi, Hele Savin 2023 ACS Photonics

CMOS Image Sensor for Broad Spectral Range with >90% Quantum Efficiency

Olli E. Setälä, Martin J. Prest, Konstantin D. Stefanov, Douglas Jordan, Matthew R. Soman, Ville Vähänissi, Hele Savin 2023 Small

Perspectives on Black Silicon in Semiconductor Manufacturing: Experimental Comparison of Plasma Etching, MACE and Fs-Laser Etching

Xiaolong Liu, Behrad Radfar, Kexun Chen, Olli Setälä, Toni Pasanen, Marko Yli-Koski, Hele Savin, Ville Vähänissi 2022 IEEE Transactions on Semiconductor Manufacturing

(oral talk) Compatibility of Al-neal in processing of Si devices with Al2O3 layer

Olli Setälä, Toni Pasanen, Jennifer Ott, Ville Vähänissi, Hele Savin 2022