2020 November Networking - ALD at Aalto University

Join in our atomic layer deposition event and network with other research groups using ALD at Aalto. Companies using ALD are also welcomed.
NN 2020 logo
Cremers et al., Applied Physics Reviews 6, 021302 (2019).

At Aalto University, many research groups' activities have a connection to atomic layer deposition (ALD). Join our networking event on two afternoons, 25. - 26.11.2020 at 12-17.

Aim: Provide a time and place where people with interest in ALD can meet and get better networked.

Who should come: All research groups working at Aalto with some connection to ALD are invited to introduce themselves in short presentations – what are the group’s capabilities, interesting recent results, and maybe challenges, too? Groups working with ALD outside Aalto University are likewise welcome to introduce themselves.

Format: Individual researchers present their activities with a poster, and optionally with a 2-minute oral poster pitch. Companies with ALD activities in Finland are also invited, and we will have an invited guest speaker from abroad.

Panopto option: Speakers have the possibility to have their talk recorded with the Panopto lecture capture system used at Aalto University.

Responsible Organizer: Prof. Riikka Puurunen (Associate Professor, tenure track, Catalysis Science and Technology), Aalto CHEM/CMET, and Catalysis research group. Event is supported by Aalto Materials Platform.

For latest updates on the programme, please see the event webpage:  https://blogs.aalto.fi/catprofopen/ald-networking-nov-2019/

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