Jihong Yim

Visitor Aalto doctoral student
Visitor Aalto doctoral student
T106 Chemical and Metallurgical Eng
Full researcher profile
https://research.aalto.fi/...
Sähköposti
[email protected]
Puhelinnumero
+358504004290

Tutkimusryhmät

  • Catalysis, Visitor (Faculty)

Julkaisut

Simulated conformality of atomic layer deposition in lateral channels: the impact of the Knudsen number on the saturation profile characteristics

Christine Gonsalves, Jorge A. Velasco, Jihong Yim, Jänis Järvilehto, Ville Vuorinen, Riikka L. Puurunen 2024 Physical Chemistry Chemical Physics

Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanol

Aitor Arandia, Jihong Yim, Hassaan Warraich, Emilia Leppäkangas, René Bes, Aku Lempelto, Lars Gell, Hua Jiang, Kristoffer Meinander, Tiia Viinikainen, Simo Huotari, Karoliina Honkala, Riikka L. Puurunen 2023 Applied Catalysis B: Environmental

Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model

Jänis Järvilehto, Jorge A. Velasco, Jihong Yim, Christine Gonsalves, Riikka L. Puurunen 2023 Physical Chemistry Chemical Physics

Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air

Jihong Yim, Eero Haimi, Miia Mäntymäki, Ville Kärkäs, René Bes, Aitor Arandia Gutierrez, Kristoffer Meinander, Philipp Brüner, Thomas Grehl, Lars Gell, Tiia Viinikainen, Karoliina Honkala, Simo Huotari, Reetta Karinen, Matti Putkonen, Riikka L. Puurunen 2023 Chemistry of Materials

Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst

Niko Heikkinen, Juha Lehtonen, Laura Keskiväli, Jihong Yim, Shwetha Shetty, Yanling Ge, Matti Reinikainen, Matti Putkonen 2022 Physical Chemistry Chemical Physics

Simulation of Conformality of ALD Growth Inside Lateral Channels: Comparison Between a Diffusion-Reaction Model and a Ballistic Model

Jorge A. Velasco, Jänis Järvilehto, Jihong Yim, Christine Gonsalves, Emma Verkama, Riikka L. Puurunen 2022

Feature-scale conformality of atomic layer deposition from continuum to free molecular flow: how Knudsen number influences thickness profile characteristics

Jorge Velasco Calsina, Christine Gonsalves, Gizem Ersavas Isitman, Jihong Yim, Emma Verkama, Daulet Izbassarov, Ville Vuorinen, Riikka Puurunen 2022

Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile

Jihong Yim, Emma Verkama, Jorge A. Velasco, Karsten Arts, Riikka L. Puurunen 2022 Physical Chemistry Chemical Physics

Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure

Eero Haimi, Oili Ylivaara, Jihong Yim, Riikka Puurunen 2021 Applied Surface Science Advances