LTL - Field emission electron microscope with litography software (JEOL7100F)

General Information

Paper Manuals: cleanroom

Location: Nanotalo cleanroom, room 160d

Contact person: Antti Laitinen

 Short description

Sample patterns

• Run file (rf6) and Design CAD file (dc2) for marker array pattern. Read the above User guide for automatic focusing during the patterning.
• Run file (rf6) and Design CAD file (dc2) for example on how to use the NPGS Fracture-mode in writing bigger areas. By Matthias Brandt.

Tutorials

Before:

1. Copy all files from the default folder "default-10mm" *Includes all the menu buttons
2. Measure the different coarse currents with "Meas Currents" in NPGS *PCD moves in + 30 sec wait => Plate moves to blank position after (will expose)
3. Modify your run files by inserting the coarse current parameters
4. Set measured currents by choosing the run file in NPGS and press "Set currents" *Currents from the file currents.txt are inserted according to coarse current parameters
5. Set measured offsets by choosing the run file in NPGS and press "Set offsets" *Offsets in the file "offsettable.txt" are inserted according to mag and coarse current

During:

1. To load Sample, press observation "off" from the JEOL program
2. Vent loading chamber (From program or from the loading chamber button "exchange chamber")
   1. Open the lock to prevent overpressure
3. Insert Sample to the holder along the arrows in the holder
4. Evacuate the loading chamber
   1. evac will stop blinking when ready
5. Open the deben chamberscope to see the infrared image
   1. "click for live image"
6. Assuming that the stage is in exchange position
   1. Insert the stick by pushing it in VERTICALLY => Otherwise, vacuum might get lost
   2. When pulling the stick out, pull all the way
7. Press WD = 10.0 mm to move the stage (observe from the camera)
8. Press observation "on" when chamber pressure below 1e-3
   1. If image does not appear, check beam blanker and plate position
   2. Either, beam blanker in blank position and beam on
   3. Or, plate position = OUT (not if patterning)
9. ACB = Auto Contrast & Brightness
10. Move by ball (slowest), mouse (1&2), or specimen stage control buttons (fastest)
11. Align the Sample, "Specimen" => "Step Control" => "Specimen Orientation"
12. Do coarse focus with stage height control (to keep WD = 10.0mm)
13. Focus on dust on the corner of the chip
    1. To read the focus value, press JEOL Ext. from NPGS =>"Remote", "Connect Socket" => "Control", "Instrument" => Focus value is given in OL
14. Do a spot first on the edge near the original focus
    1. To read the absorbed current => Press "Condition" => Open up the details for the probe current => Press absorbed current and wait for 2-3 seconds
    2. To burn spot => Move to the place you want to do the spot => Press beam off (If in blanker position) => Set current 1 and magnification 1 000 000x (maximum) => Press cursor and press spot => Press beam back on
    3. Observe absorbed current and focus to burn the spot => To check the result visually
       1. Press spot again to return to normal mode
       2. De-activate freeze by pressing the lighten up button
    4. => Stigma very easy to set on the spot
15. Move to the center of the pattern and burn another spot
16. Start patterning
    1. Set plate position = Blank
    2. Set beam status = blank
    3. Let NPGS control the beam from the switch SEM => NPGS
    4. Right click desired run file => Process run file
17. After patterning
    1. Set coarse current to 1
    2. Let SEM control the beam from the switch NPGS => SEM
    3. Move away from the center of the Sample and press beam on

After:

1. Set observation "off"
2. Press "Exchange position" => Ready when the button lights up
3. Move the sample holder to the loading chamber with the rod
   1. Remember to pull all the way
4. Vent the chamber, Open the lock to prevent overpressure
5. Take the sample holder out
6. Evacuate the loading chamber