Jihong Yim
Visitor Aalto doctoral student
Visitor Aalto doctoral student
T106 Chemical and Metallurgical Eng
Full researcher profile
https://research.aalto.fi/...
Email
[email protected]
Phone number
+358504004290
Research groups
- Catalysis, Visitor (Faculty)
Publications
Simulated conformality of atomic layer deposition in lateral channels: the impact of the Knudsen number on the saturation profile characteristics
Christine Gonsalves, Jorge A. Velasco, Jihong Yim, Jänis Järvilehto, Ville Vuorinen, Riikka L. Puurunen
2024
Physical Chemistry Chemical Physics
Conformality of atomic layer deposition analysed via experiments and modelling: case study of zinc oxide for catalytic applications
Jihong Yim
2024
Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanol
Aitor Arandia, Jihong Yim, Hassaan Warraich, Emilia Leppäkangas, René Bes, Aku Lempelto, Lars Gell, Hua Jiang, Kristoffer Meinander, Tiia Viinikainen, Simo Huotari, Karoliina Honkala, Riikka L. Puurunen
2023
Applied Catalysis B: Environmental
Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model
Jänis Järvilehto, Jorge A. Velasco, Jihong Yim, Christine Gonsalves, Riikka L. Puurunen
2023
Physical Chemistry Chemical Physics
Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air
Jihong Yim, Eero Haimi, Miia Mäntymäki, Ville Kärkäs, René Bes, Aitor Arandia Gutierrez, Kristoffer Meinander, Philipp Brüner, Thomas Grehl, Lars Gell, Tiia Viinikainen, Karoliina Honkala, Simo Huotari, Reetta Karinen, Matti Putkonen, Riikka L. Puurunen
2023
Chemistry of Materials
Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst
Niko Heikkinen, Juha Lehtonen, Laura Keskiväli, Jihong Yim, Shwetha Shetty, Yanling Ge, Matti Reinikainen, Matti Putkonen
2022
Physical Chemistry Chemical Physics
Simulation of Conformality of ALD Growth Inside Lateral Channels: Comparison Between a Diffusion-Reaction Model and a Ballistic Model
Jorge A. Velasco, Jänis Järvilehto, Jihong Yim, Christine Gonsalves, Emma Verkama, Riikka L. Puurunen
2022
Feature-scale conformality of atomic layer deposition from continuum to free molecular flow: how Knudsen number influences thickness profile characteristics
Jorge Velasco Calsina, Christine Gonsalves, Gizem Ersavas Isitman, Jihong Yim, Emma Verkama, Daulet Izbassarov, Ville Vuorinen, Riikka Puurunen
2022
Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile
Jihong Yim, Emma Verkama, Jorge A. Velasco, Karsten Arts, Riikka L. Puurunen
2022
Physical Chemistry Chemical Physics
Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure
Eero Haimi, Oili Ylivaara, Jihong Yim, Riikka Puurunen
2021
Applied Surface Science Advances