Department of Signal Processing and Acoustics

ATMOC project (2021-2024)

Metrology Research Institute is involved in project ATMOC - “Traceable metrology of soft-X-ray to IR optical constants and nanofilms for advanced manufacturing”.

Designing efficient optical and optoelectronic products requires nanomaterials with specific properties and dimensions. In the optics and semiconductor industry, the characterization of suitable nanomaterials is a challenging task. It may require accurate data acquisition, modelling, and reliable uncertainty estimation.

The purpose of this project is to create a framework for measuring the optical properties of thin-film structures over a wide range of wavelengths from infrared to X-rays. The practical characterization methods comprise traceable reflectometry, Mueller ellipsometry, and scatterometry techniques. Inverse modelling and virtual measurement methods will also be advanced in this project.

The role of Metrology Research Institute (MRI) of Aalto University in this project is to contribute to the spectrophotometric measurements and analysis thin film and test materials using Aalto’s gonioreflectometry and spectrophotometry facilities. Furthermore, MRI uses mathematical modellings to determine the optical constants and thickness of components of multilayer structures and their uncertainty analyses from the transmittance and reflectance data.

MRI also contributes to developing a virtual Muller ellipsometer to study the sensitivity of uncertainty to input parameters and to provide simulated data to reduce the measurement efforts. This virtual software facilitates the characterization of multilayer systems and obtaining their optical properties.

Contact person: Farshid Manoocheri

References

[1] S. Pourjamal, H.Mäntynen, P. Jaanson, D. M. Rosu, A. Hertwig, F. Manoocheri, and E. Ikonen, "Characterization of thin-film thickness," Metrologia 51, S302-S308 (2014).

 

Figure 1. Simplified schematic of the Cary 7000 commercial spectrophotometer with a UMS accessory for measurement of angular reflectance and transmittance. The Tungsten lamp is interchanged with a deuterium arc lamp for UV wavelength range, and with a low-pressure Hg lamp for wavelength setting calibrations.

Figure 1. Simplified schematic of the Cary 7000 commercial spectrophotometer with a UMS accessory for measurement of angular reflectance and transmittance. The Tungsten lamp is interchanged with a deuterium arc lamp for UV wavelength range, and with a low-pressure Hg lamp for wavelength setting calibrations.

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